Dakota Mace (Diné) is an interdisciplinary artist who focuses on translating the language of Diné history and beliefs. Mace received her MA and MFA in Photography and Textile Design at the University of Wisconsin-Madison and her BFA in Photography from the Institute of American Indian Arts. As a Diné artist, her work draws from the history of her Diné heritage, exploring the themes of family lineage, community, and identity. In addition, her work pushes the viewer’s understanding of Diné culture through alternative photographic techniques, weaving, beadwork, and papermaking.
She is an MFA in Studio Arts Faculty at the Institute of American Indian Arts and the photographer/research specialist for the Helen Louise Allen Textile Center and the Center of Design and Material Culture. Her work has been exhibited nationally and internationally at various conferences, museums, and galleries. She is represented by Bruce Silverstein Gallery in New York City.